Nano-imprint lithography (NIL) is a new lithographic method that offers a sub-10 nm feature size, high throughput, and low cost (1). It requires a stamp which has a lower fabrication cost and longer life time. The ultimate resolution of NIL depends on the minimum feature size in the stamp. High-resolution stamps are currently made by e-beam lithography and dry etching, and shallow stamps by e-beam lithography and metal lift-off (2). Depending on application, stamps in wafer-size scale have been studied by several groups. It is known that nearly all electrodeposited nickel alloys possess higher mechanical hardness and tensile strength compared to the pure nickel metal (3).
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