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The Effect of Sodium Silicate Concentration on The Properties of the Coating Formed on Pure Zirconium by Microarc Oxidation Coating Technique

机译:硅酸钠浓度对纯氧化涂层技术在纯锆上形成的涂层性能的影响

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In this study, zirconium oxide coatings were formed on pure zirconium by microarc oxidation technique with the electrolytes containing KOH and different amounts of sodium silicate (0-40 gr/lt) for the same coating duration of 2 hours. The microstructure, surface roughness, phase content and chemical composition of the coatings were characterized by using scanning electron microscopy, profilometery and X-ray diffractometry. It was found that the coatings on surface of zirconium consist of monoclinic ZrO_2 (m-ZrO_2) and tetragonal ZrO_2 (t-ZrO_2) phases and the addition and increasing sodium silicate concentration in the electrolyte increases amount of t-ZrO_2 phase. The coatings were well adhered to Zr substrate with some cracks and porosities in the coating for all concentrations of sodium silicate. The coating thickness and surface roughness increased with sodium silicate concentration in the electrolyte. A glaze like Si rich structure and its increase with Si rate was evident in the outermost region of the coating.
机译:在该研究中,通过Microarc氧化技术在纯锆上形成氧化锆涂层,其用含有KOH和不同量的硅酸钠(0-40gR / LT)的电解质在2小时的相同涂层持续时间。通过使用扫描电子显微镜,轮廓测定和X射线衍射法表征涂层的微观结构,表面粗糙度,相含量和化学成分。结果发现锆表面上的涂层由单斜替替替替替替替替氏蛋白(M-ZRO_2)和四边形ZrO_2(T- ZrO_2)相,并且电解质中的硅酸钠浓度增加了T-ZrO_2相的增加。涂层粘附到Zr底物中,在涂层中具有一些裂缝和孔隙,用于所有浓度的硅酸钠。涂层厚度和表面粗糙度随电解质中的硅酸钠浓度增加。在涂层的最外部区域中,Si结构的富含结构和Si速率的增加很明显。

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