Relationship between metal-assisted chemical etching condition using self-assembled particle mask and obtained morphology- Effect of dry etching process before deposition of catalyst metal

摘要

Metal assisted chemical etching produces high aspect ratio structure on a silicon substrate and thus expected to be applied to various functional surfaces. The key is patterning of catalyst metal layer of gold. In this study, self-assembly of Φ1 μm particles were used as a mask for deposition of catalyst metal Au, and regular pattern of pits along hexagonal packed structure was produced and then etched. With the increase in etching time, the height of silicon pillars increased and then they got together or aggregated forming bundles of pillars. Dry etching was introduced before Au deposition, and its effect on the morphology was made clear together with other conditions.