The radiofrequency (rf) oven can be used as a metal vapour injector for Electron Cyclotron Resonance ion sources; the application to high temperature boiling metals (like Cr, Ti and V) was recently demonstrated. Duration and reusability of oven parts were good, since only crucible needs to be maintained at a high temperature T_s. For vanadium case, achieved T_s was over 2300 K with about 280 W of rf power, with the present design and size, tailored to our 14.4 GHz ECRIS. Optimization for higher temperatures is also discussed. Materials, more than rf power coupling, emerge as ultimate limits. Comparisons with sputter probes and with different metals are briefly reported.
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