Comparison of Two Metal Ion Implantation Techniques for Fabrication of Gold and Titanium Based Compliant Electrodes on Polydimethylsiloxane

摘要

This study contrasts the implantation of 25μm thick Polydimethylsiloxane (PDMS) membranes with titanium and gold ions at 10keV and 35keV for doses from 1×10~(15) at/cm~2 to 2.5×10~(16) at/cm~2 implanted with two different techniques: Filtered Cathodic Vacuum Arc (FCVA) and Low Energy Broad Ion Beam (LEI), The influence of the ion energy, ion type, and implantation tool on the Young's modulus (E), resistivity and structural properties (nanocluster size and location, surface roughness) of PDMS membranes is reported. At a dose of 2.5×10~(16) at/cm~2 and an energy of 10keV, which for FCVA yields sheet resistance of less than 200 Ω/square, the initial value of E (0.85MPa) increases much less for FCVA than for LEI. For gold we obtain E of 5MPa (FCVA) compared to 86MPa (LEI) and for titanium 0.94MPa (FCVA) compared to 57MPa (LEI). Resistivity measurements show better durability for LEI than for FCVA implanted samples and better time stability for gold than for titanium.