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Point defects in relaxed and strained Si studied by molecular dynamics method

机译:分子动力学方法研究了轻松和紧张SI的点缺陷

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Molecular dynamics simulations using the Tersoff potential have been performed to investigate the perturbation effects caused by different kinds of the point defects (vacancies and substitutional impurities) on the strained and relaxed Si matrices. Lattice distortion, mean square displacement, pair correlation function and vibrational spectra are studied. It is found that Ge substitution lead to little distortion of the Si matrix. However, vacancy and C substitution lead to more distortion. Diffusion directions of Si atoms around different kinds of point defects are different. When C substitution is introduced in the relaxed Si matrices or Ge substitution is introduced in the strained Si matrices, the system needs longer time to reach equilibrium. The crystallinity and symmetry degree of relaxed Si matrices are more satisfying than those of strained Si matrices after relaxation. Changes of the vibrational spectra caused by vacancy and C substitution are obvious. All above have a great effect on the photoelectric properties of the materials.
机译:已经进行了使用Tersoff电位的分子动力学模拟,以研究在应变和弛豫Si基质上的不同类型缺陷(空位和替代杂质)引起的扰动效果。研究了晶格畸变,平均位移,对相关函数和振动光谱。发现Ge替代导致Si矩阵的畸变很小。然而,空缺和C替换导致更扭曲。不同类型点缺陷周围的Si原子的扩散方向是不同的。当在放宽的Si矩阵或Ge替换中引入C替换或Ge替换时,在应变的Si矩阵中引入,系统需要较长的时间达到平衡。弛豫Si基质的结晶度和对称程度比放松后的应变Si基质更令人满意。空缺和C替换引起的振动谱的变化是显而易见的。所有上面都对材料的光电性能有很大的影响。

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