Precision laser system based on complementary scanning principle for dielectric materials microprocessing.

摘要

To optimize laser processing of some materials, it is necessary to ensure high-speed displacement of the focused laser beam ～1 m/s with a great power density. A required speed can be attained owing to scanning systems based on galvanometer deflectors, but the writing field of such scanning systems is restricted to a size of less than 1 dm2 for the lasers with λ = 1-10 micron. In many laser microprocessing applications a field that must be larger by one order of magnitude required.lt is possible to solve such problems using complementary scanners. We developed several devices with use of complementary scanning principle for microprocessing with micron resolution by high power lasers (50-400 W). The developed systems contain the "fast" scanning unit consisting of precision galvanometer scanners and F-Theta lens that, in its turn, can be displaced by "slow" drives over the entire writing field. This paper will describe problems arising in creating the systems based on complementary scanner devices, namely, correct image partitioning into small writing zones, "joining" of writing elements occurred in adjacent zones, and also consideration of geometric distortions in the optical system of the scanning head and its orientation. Furthermore, in order to obtain the maximal writing speed with minimal errors over the entire field, we have to ensure effective four-drive system control. Experimental results of microprocessing of the dielectric specimens, obtained by means of created complementary scanners system, will be pesent.