首页> 外文会议>International Conference on Nanoscience and Nanotechnology >MODELING 32 V ASYMMETRIC LDMOS USING AURORA AND HSPICE LEVEL 66 FOR 180NM TECHNOLOGY
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MODELING 32 V ASYMMETRIC LDMOS USING AURORA AND HSPICE LEVEL 66 FOR 180NM TECHNOLOGY

机译:使用Aurora和HSPICE LDMOS建模32 V不对称LDMO,用于180nm技术

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In this work, the modeling strategy of 32V asymmetric High Voltage MOSFETs fabricated in 180nm High Voltage CMOS process technology using Aurora and Hspice level 66 is presented. The model is validated on the measured characteristics of asymmetric HV MOSFET and implemented on commercial circuit simulator HSPICE. The model shows excellent DC IV characteristics and good behavior for capacitances. The model also exhibits excellent scalability with transistor width and length where the model accuracy of the extracted VTH and IDSAT are within 0 to 5% at T=25°C.
机译:在这项工作中,提出了使用极光和HSPICE 66的180nm高压CMOS工艺技术制造的32V不对称高压MOSFET的建模策略。该模型在商用电路模拟器HSPICE上进行了验证了对不对称HV MOSFET的测量特性。该模型显示出优异的DC IV特性和电容的良好行为。该模型还具有出色的可扩展性,具有晶体管宽度和长度,其中提取的VTH和IDSAT的模型精度在T = 25°C时在0至5%之内。

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