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Characteristic of the Wire-Penetration Films for Stack-Die CSP Application

机译:用于堆叠模具CSP应用的线穿透薄膜的特征

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For the current advanced packages, Bismaleimide Triazine (BT) substrates are widely used for making Multi-chip package (MCP) because of its high-density I/O applications. Stack-die CSP (Chip Scale Package) is developed under the concept not only for the above advantages but also for the multifunctional applications. For the purpose of mass product, the designs of stack die-attached process should be simplified and wire-penetrated. In this paper, we focus on the characteristics of the wire-penetration films, and then designing the process to stack dies. We performed the JEDEC level 3 precondition conditions, pressure cook test (PCT) and thermal cycle test (TCT). Our results revealed that the WPF-L system is more stable than WPF-H system for the ambit storage and whole assembly process. Rheology and penetration test results also indicate The WPF-L with relative wider working window in dies mounts process than WPL-H system. Noteworthy, WPF-H exhibit higher the viscosity at ambit temperature will induce die broken issues during die pick up process. WPF-L system with a few special big filler has a concern about die surface damage during the die mount process.
机译:对于当前的先进封装,双酰胺三嗪(BT)基板广泛用于制造多芯片封装(MCP),因为其高密度I / O应用。堆叠芯片CSP(芯片刻度包)不仅在概念下开发,而不仅用于上述优点,还为多功能应用而开发。出于大规模产品的目的,应简化堆叠模具的工艺设计和渗透。在本文中,我们专注于导线渗透膜的特性,然后将该过程设计为堆叠模具。我们执行了JEDEC 3级先决条件,压力烹饪试验(PCT)和热循环测试(TCT)。我们的研究结果表明,WPF-L系统比WPF-H系统更稳定,用于AMBIT存储和整个装配过程。流变学和渗透性测试结果还指示WPF-L在模具安装过程中具有相对较宽的工作窗口而不是WPL-H系统。值得注意的是,WPF-H呈较高,Ambit温度的粘度将在模具拾取过程中诱导死亡问题。具有少数特殊大填充物的WPF-L系统对模具安装过程中的模具表面损坏有担忧。

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