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FAILURE INVESTIGATION AND ANALYSIS OF ABNORMAL CAPACITANCE OF ACCELEROMETER AFTER ICP RELEASE

机译:ICP释放后加速度计异常电容的故障调查与分析

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An abnormal capacitance case of capacitive accelerometer after inductive coupled plasma (ICP) release was investigated to solve the failure problem. scanning electron microscopy (SEM)/transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDX), X-Ray transmission inspection, epoxy resin filling/polishing were used to identify the possible root cause. Failure analysis results confirmed that abnormal capacitance occurred by some connecting combs. Based on the results of three ways to analysis, it was concluded that the abnormal capacitance was not due to the contamination between combs of accelerometer and the substrate, but due to the connection between some combs caused by the ICP etching ununiformity. The static capacitance and resistance test results also testified this conclusion.
机译:研究了电感耦合等离子体(ICP)释放后的电容式加速度计的异常电容案例以解决故障问题。扫描电子显微镜(SEM)/透射电子显微镜(TEM),能量分散X射线光谱(EDX),X射线透射检查,环氧树脂填充/抛光用于鉴定可能的根本原因。失败分析结果证实,一些连接梳子发生异常电容。基于三种分析方式的结果,得出结论是,异常电容不是由于加速度计和基板的梳子之间的污染,而是由于ICP蚀刻不均匀引起的一些梳子之间的连接。静态电容和电阻测试结果也证明了这一结论。

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