Reduction of Reflection Losses in Nonlinear Optical Crystals by Motheye Patterning

摘要

Modern microfabrication capabilities have opened a number of new andunexpected avenues for creating novel electronic and optoelectronic devices ormodifying the properties of existing ones. Some of these avenues are slated for amajor impact on mainstream technology: two classic examples are self-assembledquantum dot lasers in optoelectronics1 and silicon-on-insulator transistors2'3 inVLSI circuitry. Other less-heralded approaches are intended for nicheapplications: the performance of a well-established device can sometimes beenhanced by including a microfabrication step. This contribution will discuss anunusual technique — the so-called "motheye patterning" — that applies thecapabilities of interference lithography (IL) and submicron processing to reducesurface reflection losses in nonlinear crystals operating in the mid-infrared.