Real-Time Monitoring of Thin-Films Using Temperature-Controlled Ellipsometry for Nanotechnology Applications

摘要

Real-time monitoring using spectroscopic ellipsometry is a very powerful tool for many nanoelectronics and nanotechnology applications. It is becoming a more accessible technique since commercial heat cells can be easily adapted on existing ellipsometers. It is however still limited to small samples because of the difficulty to heat large wafers unless one mounts the ellipsometer directly on a wafer-compatible furnace. Combined with the power of spectroscopic ellipsometry, real-time monitoring can therefore accelerate the process developments of new materials by reducing the time-consuming preparation and measurement of multiple pre-annealed samples.