首页> 外文会议>Collective Phenomena in Macroscopic Systems >FILLING OF ELECTROSTATIC PLASMA LENS FOR ION-BEAM-FOCUSING BY ELECTRONS AGAINST DIRECTION OF ELECTRIC FIELD DUE TO NON-LINEAR VORTEX BEHAVIOR
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FILLING OF ELECTROSTATIC PLASMA LENS FOR ION-BEAM-FOCUSING BY ELECTRONS AGAINST DIRECTION OF ELECTRIC FIELD DUE TO NON-LINEAR VORTEX BEHAVIOR

机译:由于非线性涡行为,电子通过电子对电场中的离子束聚焦的静电等离子体镜头填充

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摘要

One mechanism of filling of electrostatic plasma lens for high-current ion-beam-focusingby electrons against direction of electric field due to non-linear vortex behavior has beenconsidered.
机译:由于非线性涡流行为引起的高电流离子束聚焦的高电流离子束聚焦的静电等离子体透镜的一种机制。

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