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AN EFFECTIVE ACCELERATED METHOD FOR ANTI-SULFUR CORROSION CAPACITY VALIDATION FOR ANTI-SULFUR TYPE ELECTRONIC PASSIVE COMPONENTS

机译:抗硫型电子无源部件的抗硫腐蚀容量验证有效加速方法

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Hardware reliability of Information Technology (IT) equipment can be easily affected by corrosive gases, moisture, contaminants and particulate matter. It can potentially cause electrical open failures due to sulfur corrosion (Ag_2S) on the inner electrode of electronic passive components. In order to improve the robustness against sulfur corrosion, many vendors adopted gold-based and silver-palladium-based inner electrode designs (noble metal) as well as other solutions, including passivation cover and reverse structure designs. New IT equipment applications, including Artificial Intelligence (AI). Big Data. 5G, Internet of Things (IoT) and Edge Computing in recent years has proliferated the need of passive electronic components and the industry is facing passive component shortage. Therefore, quality control is becoming more critical in reducing poor quality risk. Flowers of Sulfur (FoS) is a popular method to validate the anti-sulfur corrosion capability of electronic passive components. However, the condition of single corrosive gas (sulfur vapor) is not enough to represent the accelerated corrosion exposure in field environments. It has been stipulated that typical testing methods as outlined in ASTM B809 and EIA-977 may not be totally effective in driving Anti-Sulfur Resistor (ASR) failure occurrence at 105°C/750 hours (test to pass), or even longer duration. Despite testing at those conditions, end-customers have reported sulfur corrosion-related failures. Therefore, it is necessary to develop an effective accelerated method for anti-sulfur corrosion capacity validation for anti-sulfur type electronic passive components. In this paper, three conditions of FoS test were carried out to validate the anti-sulfur corrosion capability of ASR components. We introduced chlorine-gas as another acceleration factor, and benchmarked it against ASTM B809 and EIA-977 FoS tests. Several analytical methods were used in this work, including, high resolution 3D X-Ray Microscope (3D X-Ray), Cross section polisher, (CP). Scanning Electron Microscopy (SEM) and Energy-Dispersive X-ray spectroscopy (EDX). Finally, we found that FoS with chlorine-gas condition is the most aggressive of all conditions.
机译:信息技术(IT)设备的硬件可靠性可容易受到腐蚀性气体,水分,污染物和颗粒物质的影响。由于电子无源元件的内部电极上的硫腐蚀(AG_2S),它可能导致电开放失效。为了提高硫磺腐蚀的鲁棒性,许多供应商采用基于金和基于银钯的内电极设计(贵金属)以及其他溶液,包括钝化盖和反向结构设计。新的IT设备应用程序,包括人工智能(AI)。大数据。 5G,近年来的东西互联网(物联网)和边缘计算增殖了无源电子元件的需要,行业面临被动部件短缺。因此,质量控制在降低质量差的风险方面变得更加重要。硫(FOS)的花是一种验证电子无源部件的抗硫腐蚀能力的流行方法。然而,单腐蚀气体(硫蒸气)的条件不足以表示现场环境中的加速腐蚀暴露。已经规定,ASTM B809和EIA-977中概述的典型测试方法可能在105°C / 750小时(测试通过),甚至更长的持续时间时,典型的测试方法可能不会完全有效。尽管在这些条件下进行了测试,但最终客户已报告硫磺相关的失败。因此,有必要为抗硫型电子无源部件开发有效的抗硫腐蚀能力验证方法。在本文中,进行了三种FOS测试的条件以验证ASR组分的抗硫腐蚀能力。我们将氯气引入另一个加速度因子,并将其与ASTM B809和EIA-977 FOS测试基准测试。在该工作中使用了几种分析方法,包括高分辨率3D X射线显微镜(3D X射线),横截面抛光机(CP)。扫描电子显微镜(SEM)和能量分散X射线光谱(EDX)。最后,我们发现具有氯气状况的FOS是所有条件的最具侵略性。

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