A gas barrier film composed of SiO2/Al2O3 multilayers on flexible substrates

摘要

A gas barrier film composed of SiO2/Al2O3 multilayers on flexible PEN and PI substrates is studied. The multilayers are obtained by stacking six SiO2/Al2O3 pairs utilizing the RF sputtering, and each layer is about 60 nm in thickness The barrier performances are further identified by the accelerated transparent Ca tests we proposed and the OLED lifetime tests. The water vapor transmission rates (WVTR) of the gas barrier films are calculated to be 5.05><10'3 at 85°C/85%RH and 9.5*10'6 at 20°C/60%RH, respectively.