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Towards Silicon-based Longwave Integrated Optoelectronics (LIO)

机译:走向硅基龙波集成光电子(LIO)

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The vision of longwave silicon photonics articulated in the Journal of Optics A, vol. 8, pp 840-848, 2006 has now come into sharper focus. There is evidence that newly designed silicon-based optoelectronic circuits will operate at any wavelength within the wide 1.6 to 200 μm range. Approaches to that LWIR operation are reviewed here. A long-range goal is to manufacture LWIR OEIC chips in a silicon foundry by integrating photonics on-chip with CMOS, bipolar, or BiCMOS micro-electronics.. A principal LWIR application now emerging is the sensing of chemical and biological agents with an OE laboratory-on-a-chip. Regarding on-chip IR sources, the hybrid evanescent-wave integration of III-V interband-cascade lasers and quantum-cascade lasers on silicon (or Ge/Si) waveguides is a promising technique, although an alternative all-group-IV solution is presently taking shape in the form of silicon-based Ge/SiGeSn band-to-band and inter-subband lasers. There is plenty of room for creativity in developing a complete suite of LWIR components. Materials modification, device innovation, and scaling of waveguide dimensions are needed to implement microphotonic, plasmonic and photonic-crystal LWIR devices, both active and passive. Such innovation will likely lead to significant LIO applications.
机译:长波硅光子学的眼光在光学杂志A,第一卷的阐述。 8,第840-848,2006年已经进入更加突出。有证据表明,新设计的基于硅的光电子电路将宽1.6至200μm范围内的任何波长进行操作。途径是长波运行的审查这里。远距离的目标是通过用CMOS,双极或BiCMOS微电子芯片上集成光子学制造在硅铸造LWIR OEIC芯片..一个主要应用LWIR现在是新兴化学和生物试剂的用OE传感实验室上的单芯片。关于片上红外光源,III-V族的混合瞬逝波的集成带间级联激光器和量子级联激光器上硅(或锗/ Si)的波导是一种有前途的技术,尽管可替代的所有基团的IV溶液是目前正在形成在硅基锗/ SiGeSn带 - 能带和子带间激光器的形式。有足够的空间开发完整的长波红外组件套件创造力。材料改性,设备创新,波导尺寸的缩放需要实现微光子,等离激元和光子晶体LWIR装置,主动和被动。这样的创新将有可能导致显著LIO应用。

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