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Electrochemical Formation of Nano-structured Metal Deposits and Anodic Oxide Coatings by Applying (DC + AC) Pulses and Using Drag Reducing Polymer Additives

机译:纳米结构金属沉积物和阳极氧化物涂层的电化学形成通过施加(DC + AC)脉冲和使用阻力还原聚合物添加剂

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Two competing factors control the grain size of the electrodeposits: the nucleation of new crystals and the growth of existing crystals. Nanocrystal formation requires set of operating parameters that promote the nucleation of new crystals. If all other conditions stay the same, this process takes place when the concentration of the reacting species (metal and other ions) in the diffusion layer adjacent to the substrate is as high as that in the bulk solution. Therefore, thinner diffusion layers are related to faster rates of restoration by diffusion of the bulk concentration of ions consumed during the pulse on-time. The present paper presents a new approach in the production of nano-structured metal electrodeposits and anodic oxide coatings that combines (DC+AC) pulse application with the addition in electrolytes small quantities of drag reducing polymers (DRP). Typically used to diminish the skin-friction drag of the turbulent flow, these polymers can be also added into flowing electrolytes to reduce the thickness of the boundary and diffusion layers. In support of the advantages and efficiency of the proposed electrochemical technology this paper offers three examples of (DC+AC) pulse formation: 1) nickel deposits, 2) aluminium, and 3)titanium anodic oxide coatings. In all three cases the coatings' nano-structure determines their excellent functional properties.
机译:两个竞争因素控制电沉积物的晶粒尺寸:新晶体的成核和现有晶体的生长。纳米晶体形成需要一套操作参数,促进新晶体的成核。如果所有其他条件保持不变,则当与底物相邻的扩散层中的反应物种(金属和其他离子)的浓度高于本体溶液中的反应物种(金属和其他离子)的浓度进行该过程。因此,较薄的扩散层与通过在脉冲期间消耗的离子的大量浓度的扩散来恢复的更快恢复速率。本文呈现了一种新方法,在生产纳米结构金属电沉积和阳极氧化物涂层中,将(DC + AC)脉冲施加在电解质中少量阻力还原聚合物(DRP)中的添加。通常用于减小湍流的皮肤摩擦拖动,这些聚合物也可以加入流动的电解质中以减小边界和扩散层的厚度。为了支持所提出的电化学技术的优点和效率本文提供了三种(DC + AC)脉冲形成的示例:1)镍沉积物,2)铝和3)钛阳极氧化物涂料。在所有三种情况下,涂层的纳米结构决定了它们的优异功能性。

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