Application of Integrated Process Metrology System on PVD Processes for Real-time Fault Detection - (PPT)

摘要

The value of using diagnostic sensors in the semiconductor industry for maintenance and troubleshooting has long been realized. With recent advancements in integration, sensors such as a residual gas analyzer (RGA) can be automated using a multi-sensor platform - FabGuard Integrated Process Metrology (IPM) controller. This study is applied an IPM system on Endura tool for detecting real-time tool and process excursion and identifying the root cause in PVD processes at a semiconductor fab. At the heart of an IPM system is an in-situ sensor that directly measure process conditions. The IPM controller managers the advanced sensors including RGA, particle detectors, RF probes, and arc detectors so they function properly and collect meaningful data - at the right times and in the correct way. Then it analyzes those process data provided by in-situ sensors as well as data about equipment and even the wafer itself- all in real time. The timely available of analyzed results allows you to fingerprint process conditions, identify process faults, pinpoint problems, and tune recipes for greater yield.