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Thermally Assisted Writing of Cells with IrMn Pinning Using 27 Nanosecond Pulses

机译:使用27纳秒脉冲具有IRMN钉扎的电池热辅助写入

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The authors recently showed analytically that very small and dense SDT memory cells arrays (60 nanometer diameter, 6 minimum feature squared) can be achieved with SDT memory cells in which the information is stored in the direction of the IrMn low blocking temperature pinning [1,2,3]. The reference layer consisted of a synthetic antiferromagnet pinned with a high blocking temperature antiferromagnet. To demonstrate the durability and stability of the written IrMn pinning, a variety of test were conducted. For simplicity in fabrication, the test were conducted with just spin valve cells rather SDT cells.
机译:作者最近通过SDT存储器单元分析地显示了非常小而致密的SDT存储器单元阵列(60纳米直径,6个最小特征平方),其中信息存储在IRMN低阻挡温度固定的方向上[1, 2,3]。参考层由用高封端温度反霉菌固定的合成反霉素组成。为了证明书面IRMN钉扎的耐久性和稳定性,进行了各种测试。为简单地制造,试验是用旋转阀电池相当SDT细胞进行的。

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