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Response of Solid 4{sup left}He to External Stress: Interdigital Capacitor Solid Level Detector and Optical Interferometer

机译:固体4 {sup离开}他到外部压力的响应:争端电容器固体水平探测器和光学干涉仪

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Two experiments are being conducted to observe the liquid/solid interface of 4{sup left}He near 1 K. Interesting instabilities are expected to occur when the solid is non-hydrostatically stressed. (1) A compact interdigital capacitor is used as a level detector to observe solid 4{sup left}He to which stresses are applied externally. The capacitor consists of 38 interlaced 50 μm wide and 3.8 mm long gold films separated by 50 μm and deposited onto a 5 mm by 5 mm sapphire substrate. The capacitor is placed on one flat end wall of a cylindrical chamber (xx mm diameter and xx mm long). The solid is grown to a known height and a stress is applied by a tubular PZT along the cylindrical axis. The observed small change in height of the solid at the wall is linearly proportional to the applied stress. The solid height decreases under compressive stress but does not change under tensile stress. The response of the solid on compressive stress is consistent with the expected quadratic dependence on strain. (2)Interferometric techniques are being developed for observing the solid 4{sup left}He surface profile. A laser light source is brought into the low temperature region via single mode optical fiber. The interference pattern is transmitted back out of the low temperature apparatus via optical fiber bundle. The solid 4{sup left}He growth chamber will be equipped with two PZT's such that stress can be applied from orthogonal directions. Orthogonally applied stress is expected to induce surface instability with island-like deformation on a grid pattern. Apparatus design and progress of its construction are described.
机译:正在进行两个实验以观察液/固体界面的4 {SUP左}接近1k的液体/固体界面。预期当固体不彻底压力时,预期有趣的不稳定性。 (1)紧凑型叉指电容用作水平检测器,以观察固体4 {SUP左}何处,应力在外部施加压力。电容器由38隔行的50μm宽和3.8mm长金膜组成,分隔50μm并沉积在5mm的蓝宝石衬底上。电容器放置在圆柱形室的一个平坦端壁上(XX mm直径和XX mm长)。将固体生长至已知的高度,并且沿圆柱形轴线通过管状PZT施加应力。在壁上观察到的固体高度的小变化与施加的应力线性成比例。固体高度在压缩应力下减少,但在拉伸应力下不会改变。固体对压缩应力的响应与预期对应变的二次依赖性一致。 (2)正在开发干涉技术,用于观察固体4 {SUP左}他表面剖面。激光光源通过单模光纤进入低温区域。干涉图案通过光纤束通过光纤束传递退回。 HE GRANGES室的固体4 {SUP左} HE GRANGES室将配备两个PZT,使得能力可以从正交方向施加。预计正交施加的应力将在网格图案上用岛状变形引起表面不稳定。描述了设备设计和其结构的进展。

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