The fabrication of three-dimensional photonic bandgap materials and the controlled incorporation of point, linear and planar defects into these crystals is a major challenge in materials research today. We show in this report that these purposes can be achieved by photoelectrochemical etching of lithographically prestructured silicon. Our advanced etching method allows the fabrication of three-dimensional photonic crystals with simple cubic symmetry. The performed calculations suggest complete bandgaps of 5% for the realized bulk structures. By lithographic prestructuring vertical line and planar defects can be induced, whereas horizontal planar defects can be created during the etching step. By combining both structuring techniques point defects can be fabricated.
展开▼
