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DCEMS Study of Thin Stainless Steel Films Deposited by RF Sputtering of AISI316L

机译:AISI316L沉积沉积的薄不锈钢薄膜的DCEMS研究

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Thin stainless steel films were prepared on SiO2/Si plate heated at 100°C and 400°C using AISI316L as target, by a RF magnetron Ar sputtering method. RF sputtered-deposited films and the oxidized surface layers by post heating were characterized by depth selective conversion electron M?ssbauer spectroscopy (DCEMS) using a He+5%CH4 gas proportional counter. The as-deposited films consisted of magnetic phases, the magnetic orientation of which had a tendency to be perpendicular to the surface of the film. In the case of the deposited films at substrate temperature of 100°C, a small amount of Fe2O3 and ferritic stainless steel formed by post-heating in air. A magnetic subcomponent and a austenite phase were formed in the films deposited at substrate temperature of 400°C. σ-Fe2O3 and magnetite formed easily on the top and middle layers of the films by post-heating in air. The oxide states of the films deposited at different temperatures of substrate were clearly distinguished by post-heating. Thus it was found by DCEMS that the structures of the deposited films were strongly affected by the preparation method and the temperature of the substrate.
机译:通过RF磁控管AR溅射法在100℃和400℃下在100℃和400℃加热的SiO 2 / Si板上制备薄不锈钢薄膜。通过对后加热后溅射沉积的薄膜和氧化表面层通过深度选择性转化电子M≥Ssbauer光谱(DCEM)使用HE + 5%CH4气体比例计数。如此沉积的膜由磁性相,磁性取向,其中必须是垂直于膜的表面的倾向。在底物温度为100℃的沉积膜的情况下,通过在空气中加热形成的少量Fe 2 O 3和铁素体不锈钢。在沉积在400℃的底物温度的薄膜中形成磁性子组分和奥氏体相。 Σ-Fe2O3和磁铁矿通过在空气中的加热后加热而在薄膜的顶层和中层上形成。通过后加热清楚地区分沉积在基质的不同温度下的膜的氧化物状态。因此,DCEM发现,沉积膜的结构受到制备方法和基材的温度的强烈影响。

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