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NON-DESTRUCTIVE INSPECTION METHOD FOR DETECTING OPEN FAILURES IN FLIP CHIP STRUCTURES

机译:用于检测倒装芯片结构的开放故障的非破坏性检查方法

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A new nondestructive evaluation method of adhesion condition between a Si chip and small metallic bumps in a flip chip bonding structure is proposed. The local deformation of a surface of a Si chip mounted on a substrate increases drastically between two bumps with decrease of the thickness of the chip thinner than 200 μm. The magnitude of the local deformation exceeds 100 nm easily. Once the lack or delamination of the metallic bumps occurs at the interface, the local deformation at a surface of a Si chip around the bump changes remarkably. The change of the magnitude of the local deformation reaches about 50 nm to 600 nm depending on the thickness of the chip. Such a small change of deformation can be measured using a scanning blue laser microscope. Therefore, the adhesion condition of the area-arrayed bumps can be examined by measuring the local deformation of a surface of an LSI chip mounted on a substrate.
机译:提出了一种新的非破坏性评价方法,倒装芯片粘合结构中的Si芯片和小金属凸块之间的粘合条件。安装在基板上的Si芯片表面的局部变形在两个凸块之间急剧增加,芯片厚度低于200μm。局部变形的幅度容易超过100nm。一旦在界面处发生金属凸块的缺失或分层,就会显着变化围绕凸块的Si芯片表面处的局部变形。根据芯片的厚度,局部变形幅度的变化达到约50nm至600nm。可以使用扫描蓝色激光显微镜测量这种微小变形变化。因此,可以通过测量安装在基板上的LSI芯片的表面的局部变形来检查区域阵列凸块的粘附条件。

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