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Simple Planar Structure Hydrogen Gas Sensor Device with Large Response

机译:简单的平面结构氢气传感器装置具有大的反应

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Hydrogen gas sensor device with simple planar structure based on silicon was fabricated only by using a lift-off technique of an evaporated metal film. The device consists of ohmic source and drain electrodes and platinum Schottky gate electrode. This sensor device has a little similar property as FET. Current-voltage characteristics between the source and drain of the device are sensitive to hydrogen gas. The voltage differnce between in hydrogen ambient and oxygen ambient is about 2.3 volts for a constant current of 0.9mA. The device is also sensitive to hydrogen in air. Electrons flow in the buried channel formed between the gate electrode and the pn junction. It was confirmed that the gate bias influences the properties.
机译:具有基于硅结构简单平面结构的氢气传感器装置,仅通过使用蒸发的金属膜的剥离技术制造。该装置由欧姆源和漏电极和铂肖特基栅电极组成。该传感器装置与FET具有稍微类似的特性。装置的源极和漏极之间的电流电压特性对氢气敏感。在氢环境和氧气环境中的电压差异为约2.3伏,恒定电流为0.9mA。该装置对空气中的氢也敏感。电子在掩埋通道中流动形成在栅电极和PN结之间。确认栅极偏置影响属性。

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