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Nanoindentation Studies on Precipitation Hardening of Ti-rich TiNi Shape Memory Ribbons

机译:富含TI富尼形型记忆带沉淀硬化的纳米intentation研究

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In recent years, the applications of TiNi SMAs in microelectromechanical systems (MEMS) have got more interest because of their outstanding work output density, say 1~07 Jm~(-3) [1]. Therefore, the properties of TiNi SMAs exhibited at the microscale or even nanoscale become significant issues. Two main fabrication methods to obtain small-scale TiNi SMAs are sputtering and rapid solidification process (RSP). Recent studies on the amorphous Ti-rich TiNi thin film fabricated under low sputtering temperature discovered the nanoscale Ti-rich Guinier-Preston (GP) zones [2]. Similarly, Ti-rich GP zones have also been observed in Ti-rich TiNi ribbons prepared by rapid solidification technique [3]. To reveal the hardness evolution associated with precipitation hardening with aging time on these kinds of samples, a sophisticated equipment, nanoindenter, is employed to obtain reliable hardness values.
机译:近年来,由于其出色的工作输出密度,TINI SMA在微机电系统(MEMS)中的应用更多,例如1〜07 JM〜(-3)[1]。因此,在微观尺寸甚至纳米级显示的TINI SMA的特性成为重要的问题。获得小型TINI SMA的两个主要制造方法是溅射和快速凝固过程(RSP)。最近关于低溅射温度制造的无定形TI富硅薄膜的研究发现了纳米尺度Ti的Guinier-Preston(GP)区域[2]。类似地,在通过快速凝固技术制备的Ti富含TINI丝带中也已经观察到Ti的GP区[3]。为了揭示在这些样品上具有老化时间的沉淀硬化与沉淀硬化相关的硬度进化,采用复杂的设备,纳米茚,纳米茚,以获得可靠的硬度值。

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