首页> 外文会议>Conference on plasmonics >Applications of surface plasmon and phonon polaritons to developing left-handed materials and nano-lithography
【24h】

Applications of surface plasmon and phonon polaritons to developing left-handed materials and nano-lithography

机译:表面等离子体和声子偏振子在左手材料和纳米光刻中的应用

获取原文

摘要

Despite recent successes in making left-handed materials in the microwave frequency range, there has been little progress in achieving same for infrared frequencies. A novel approach to making a material with negative index of refraction using photonic crystals made of dielectric components with a small (of order minus one)negative dielectric permittivity has recently been proposed. Periodic structures with negative-epsilon dielectrics support surface waves which can have a negative group velocity.The nature of these surface waves depends on the dielectric components:they are surface plasmons for plasmonic materials (such as metals) or surface phonon polaritons for polar crystals (such as SiC,ZnSe,GaP) with the reststrahlen band.The advantages of using phononic materials (long phonon lifetime,scientifically important frequency range)will be illustrated. Depending on the photonic lattice (square or hexagonal), the resulting meta-material can be either isotropic,or strongly anisotropic. Another application of the negative-epsilon materials is nano-lithography.As was suggested earlier (Pendry 2000,Shen and Platzman 2002), any material with ∈ = -1 can be used to significantly enhance near-field imaging. It is shown that a thin slab of SiC is capable to focus the 10.55 micron radiation of a CO_2 laser to several hundred nanometers, thus paving the way for a new nano-lithographic technique: Phonon Enhanced Near Field Lithography in Infrared (PENFIL). Analytic calculations of the fields in the focus of such slab are presented, and parametric dependence on the slab width and phonon lifetime explored.
机译:尽管在微波频率范围使左手材料最近的成功,已经在实现相同的红外频率方面进展甚微。一种制造材料使用具有小(为了减中的一个)由介电元件的光子晶体负介电常数折射负折射率的新方法最近已经提出。与负的ε-电介质支撑表面波周期性结构其可具有这些表面波的负组velocity.The性质取决于介电元件:它们是表面等离子体激元用于等离子体激元材料(如金属)或表面声子极化极性晶体(如SiC,硒化锌,GAP)使用声子的材料(长声子寿命,科学重要的频率范围内的剩余射线band.The优点)进行说明。取决于光子晶格(正方形或六边形),所得到的超材料可以是各向同性的,或强各向异性的。负的ε-材料的另一应用是nano-lithography.As建议早期(彭德里2000,沉和2002 Platzman),其中∈=任何材料-1可用于显著增强近场成像。结果表明,SiC的薄板坯能够向CO_2激光器的10.55微米辐射聚焦到几百纳米,因此铺路一个新的纳米光刻技术:声子增强近场光刻在红外(PENFIL)。在这样的板坯的焦点的字段的分析计算被呈现,并且在板坯宽度和声子寿命参数依赖探讨。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号