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Practical Quality Metrics for Resolution Enhancement Software

机译:分辨率增强软件的实用质量指标

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The past few years have seen an explosion in the application of software techniques to improve lithographic printing. Techniques such as optical proximity correction (OPC) and phase shift masks (PSM) increase resolution and CD control by distorting the mask pattern data from the original designed pattern. These software techniques are becoming increasingly complicated and non-intuitive; and the rate of complexity increase appears to be accelerating. The benefits of these techniques to improve CD control and lower cost of ownership (COO) is balanced against the effort required to implement them and the additional problems they create. One severe problem for users of immature and complex software tools and methodologies is quality control, as it ultimately becomes a COO problem. Software quality can be defined very simply as the ability of an application to meet detailed customer requirements. Software quality practice can be defined as the adherence to proven methods for planning, developing, testing and maintaining software. Although software quality for lithographic resolution enhancement is extremely important, the understanding and recognition of good software development practices among lithographers is generally poor. We therefore start by reviewing the essential terms and concepts of software quality that impact lithography and COO. We then propose methods by which semiconductor process and design engineers can estimate and compare the quality of the software tools and vendors they are evaluating or using. We include examples from advanced process technology resolution enhancement work that highlight the need for high-quality software practices, and show how to avoid many problems. Note that, although several authors have worked in software application development, our analysis here is somewhat of a black box analysis. The black box is the software development organization of an RET software supplier. Our access to actual developers within these organizations is very limited. In so far as our comments with respect to the internal workings of these development organizations go, we rely on the interactions we have had with applications engineers and other technical specialists who provide our interface to the development organizations.
机译:在过去的几年里,在应用软件技术方面已经看到了改善平版印刷的爆炸性。通过从原始设计模式扭曲掩模图案数据来增加诸如光学邻近校正(OPC)和相移掩模(PSM)的技术增加分辨率和CD控制。这些软件技术变得越来越复杂和非直观;复杂性增加率似乎正在加速。这些技术改善CD控制和较低的所有权成本(COO)的好处是均衡违背实施它们所需的努力以及他们创造的其他问题。对未成熟和复杂软件工具和方法的用户的一个严重问题是质量控制,最终成为COO问题。软件质量可以非常简单地定义为应用程序满足详细的客户要求的能力。软件质量实践可以定义为遵守规划,开发,测试和维护软件的证明方法。虽然光刻分辨率的软件质量增强非常重要,但对单片机之间的良好软件开发实践的理解和识别普遍差。因此,我们首先审查影响光刻和COO的软件质量的基本术语和概念。然后,我们建议半导体过程和设计工程师可以估算和比较它们正在评估或使用的软件工具和供应商的质量。我们包括来自高级过程技术解决方案的示例,突出了高质量软件实践的需要,并展示了如何避免许多问题。请注意,虽然若干作者在软件应用程序开发中工作,但我们的分析在这里有一定的黑匣子分析。黑匣子是RET软件供应商的软件开发组织。我们访问这些组织内的实际开发人员非常有限。除了我们对这些发展组织的内部运作的评论之外,我们依靠我们与应用工程师和其他技术专家提供的互动,他们为开发组织提供了界面。

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