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Quantum Mechanical Effects Correction Models for Inversion Charge and Current-Voltage (I-V) Characteristics of the MOSFET Device

机译:用于反转电荷的量子机械效应校正模型和MOSFET器件的电流 - 电压(I-V)特性

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Analytic 1-D quantum mechanical effects correction formulae for the MOSFET inversion charge and I-V characteristics are derived from the density gradient (DG) model using matched asymptotic expansion techniques. Results for the classical drift-diffusion (DD) equations using asymptotic techniques have been achieved by Please [1], Ward [2] and Markowich [3]. Ward's results were improved in [4] to achieve explicit formulae for MOSFET I-V characteristics, which are accurate over the range of device voltages. Ancona, [6], introduced the DG theory to model quantum effects in electron and hole transport equations. The numerical simulation results of the I-V and the capacitance-voltage (C-V) characteristics using the DG model showed good comparison with data, see [7,8]. This numerical approach has been useful at the device simulation level. However, for circuit analysis applications a simple analytic model is required.
机译:用于MOSFET反转电荷和I-V特性的分析1-D量子机械效应校正公式源自匹配的渐近扩展技术的密度梯度(DG)模型。通过请通过[1],病房[2]和Markowich [3]实现了使用渐近技术的经典漂移扩散(DD)方程。病房的结果在[4]中得到了改进,以实现MOSFET I-V特性的明确公式,这在设备电压范围内准确。 ACCONA,[6]介绍了DG理论以模拟电子和空穴传输方程的模型量子效应。使用DG模型的I-V和电容电压(C-V)特性的数值模拟结果显示出与数据的良好比较,见[7,8]。这种数值方法在设备仿真级别有用。但是,对于电路分析应用,需要简单的分析模型。

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