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TEM study of strain states in III-V semiconductor epitaxial layers

机译:III-V半导体外延层中应变状态的TEM研究

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The strain states induced by a lattice mismatch in epitaxial systems have been studied by Transmission Electron Microscopy (TEM) using the moire fringe technique on plane view samples. For the GaSb/(001)GaAs system, moire patterns suggest that the GaSb layer is free of stress and homogeneously relaxed by a perfect square array of Lomer dislocations. A 10 nm thick layer of GaInAs (20% In concentration) grown on (001)GaAs does not give any moire fringes for all low-index Bragg reflections: this result indicates that the effective misfit strain does not correspond to the theoretical one described by the elastic theory. Segregation effects are expected to play an important role in the relaxation of the misfit strain.
机译:通过在平面视图样本上使用莫尔条纹技术的透射电子显微镜(TEM)研究了通过外延系统中的格子错配诱导的晶格失配诱导的应变状态。对于Gasb /(001)GaAs系统,Moire图案表明气体层没有压力并且通过完美的洛米特·脱位阵列均匀地松弛。在(001)GaAs上生长的10nm厚的GAINA(浓度为20%)不会给出所有低折射率布拉格反射的任何莫尔条纹:该结果表明有效的错配菌株与所描述的理论不相对应弹性理论。预计分离效应将在放松不粘合菌株的放松中发挥重要作用。

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