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Epitaxial Growth of Metal and Superconductor Oxide Films

机译:金属和超导体氧化膜的外延生长

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In this presentation we will discuss the epitaxial growth of metal and superconductor oxide layers on bi-axial textured substrates. It is well established now that to obtain superior critical current densities for YBCO superconductors we need biaxially textured crystalline substrates. One way to accomplish biaxial texturing in a superconducting material is to grow epitaxial YBCO onto biaxial textured substrates. Superconducting oxide layers cannot be deposited directly on textured metal substrates for example Ni and Ni-W, and Cu since superconductors interact adversely with the substrate in a manner that degrades the superconductor material, especially during the high temperatures at which the superconductor materials are deposited or processed. It is also desirable to have a textured Ni layer on paramagnetic Ni-W substrate since Ni-W is more oxidative in nature. To overcome these adverse interactions, a buffer layer of material is often deposited between the substrate and the superconducting material to form a chemical barrier between the metal substrate and the superconductor. At present we are developing biaxial textured seed metal buffer layer materials inexpensively by electrodeposition method. We successfully electroplated biaxially textured Au on Ni, Ni-W and Cu and also Ni on Ni-W and Cu. In this meeting we will discuss the epitaxial growth of electrodeposited Ni and Au and also the superconducting YBCO material prepared epitaxially by PLD method.
机译:在本文中,我们将讨论双轴纹理衬底上的金属和超导体氧化物层的外延生长。现在已经完全建立,以获得YBCO超导体的卓越的临界电流密度,我们需要双轴纹理的晶体基材。在超导材料中实现双轴纹理的一种方法是将外延YBCO生长到双轴纹理的基材上。超导氧化物层不能直接沉积在例如Ni和Ni-W的纹理金属基板上,并且由于超导体以降解超导体材料的方式与基板对基板相互作用,特别是在超导材料沉积的高温期间或处理。由于Ni-W本质上更氧化,因此还希望在顺磁Ni-W底物上具有纹理的Ni层。为了克服这些不利相互作用,通常在基板和超导材料之间沉积一种缓冲材料层,以在金属基板和超导体之间形成化学屏障。目前我们正在通过电沉积方法廉价地开发双轴纹理的种子金属缓冲层材料。我们在Ni-W和Cu上成功地在Ni,Ni-W和Cu上电镀了双轴纹理Au,也是Ni-W和Cu。在本次会议中,我们将讨论电沉积Ni和Au的外延生长以及通过PLD方法外延制备的超导YBCO材料。

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