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Sensitivity Analyses for Construction of Monochrome Electron Guns

机译:单色电子枪施工敏感性分析

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摘要

Manufacturing irregularities and misalignments in electron guns for CRTs degrade the resolution, especially at high brightness. Using simulations of an electron gun that are 3D and include space charge, the spot size, which directly determines resolution, is calculated. These simulations are then used to calculate the sensitivities of spot size to misalignments part-size tolerances, and lens out-of-roundness. Sensitivities for the manufacture of electron guns are defined and calculated. These sensitivities connect misalignments, part-size tolerances, and lens out-of-roundness to beam displacement in the lens to beam size in the lens, and to focus astigmatism, respectively. With specifications for tolerances and misalignments, the distribution of spot sizes expected in manufacturing CRTs can be calculated. The importances of the specifications are prioritized in Pareto charts. Logistics show which construction irregularity groups are benign and which ones threaten production crises. While monochrome electron guns are used to illustrate these concepts, they have been used for color electron guns and nanolithography, and they are applicable to many electron-optical systems.
机译:用于CRT的电子枪中的制造违规性和未对准降低分辨率,特别是在高亮度下。计算使用3D的电子枪的模拟,包括空间电荷,直接确定分辨率的光斑尺寸。然后使用这些模拟来计算光斑尺寸的敏感性,以使未对准部分尺寸公差以及镜头出圆形的镜头。定义和计算用于制造电子枪的敏感性。这些敏感性地连接错位,零件大小公差和镜头,以分别在镜头中的镜片尺寸和聚焦散光的镜片置换。通过规范的公差和错位,可以计算制造CRT中预期的光斑尺寸的分布。规范的重要性在Pareto图表中优先考虑。物流表明,哪些施工不规则群体是良性的,哪些威胁到生产危机。虽然单色电子枪用于说明这些概念,但它们已被用于彩电子枪和纳米光刻,并且它们适用于许多电子 - 光学系统。

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