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A comparative study on electroluminescence from C-containing silicon oxide and Si-containing silicon oxide films

机译:含C含氧化硅和含Si氧化硅膜的电致发光的比较研究

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C-containing silicon oxide (CSO) and Si-containing silicon oxide (SSO) films were deposited using the RF magnetron sputtering technique with a C-SiO_2 and a Si-SiO_2 composite target, respectively. The Au/CSO/p-Si and Au/SSO/p-Si structures were fabricated and their electroluminescence (EL) characteristics were comparatively studied. Both of the Au/CSO/p-Si and Au/SSO/p-Si structures have rectifying behavior. All the EL spectra from the two types of the structures have peak positions around 650-660nm (~1.9eV). The EL mechanisms for the Au/CSO/p-Si and Au/SSO-p-Si structures have been discussed.
机译:使用具有C-SiO_2和Si-SiO_2复合靶的RF磁控溅射技术沉积含C的含氧化硅(CSO)和含Si的氧化硅(SSO)膜。制造Au / CSO / P-Si和Au / SSO / P-Si结构,并且它们的电致发光(EL)特性进行了相对较好。 AU / CSO / P-SI和AU / SSO / P-SI结构都具有整流行为。所有来自两种结构的EL光谱都具有约650-660nm(〜1.9ev)的峰位置。已经讨论了AU / CSO / P-Si和AU / SSO-P-Si结构的EL机制。

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