Development of Generation System of Dry Ultra Fine Particles and Filtration Efficiency Evaluation of In-line Filters for Semiconductor Process Gases

摘要

We have developed a welding fume generation system that can generate dry nano-particles with good reproducibility. Particle removal rates of several in-line filters to remove contaminant particles from process gases for semiconductor industries were evaluated using the welding fume with diameter ranging from 20 to 180nm. As a results of the test, the evaluated filters were classified as a group which could remove nano-particles more than 99.999% and the other group which could remove them less than 99%, in agreement with their specifications of the particle removal rates.