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STUDY ON ANODIC OXIDE FILMS IN Nb-Ta ALLOYS BY IN SITU OPTOELECTROCEMICAL MEASUREMENTS

机译:用原位光电诊断测量研究Nb-Ta合金中阳极氧化物膜

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It is well known that thin films of niobium and tantalum pentoxides and its mixed oxides, (Nb,Ta)_(2)O_(5), can be grown anodically on the surface of these metals and alloys, by placing samples in an electrochemical cell containing on aqueous solution and two or three electrodes under a suitable anodic voltage. These films exhibit varies colors depending on the thickness. Several techniques have been used to characterize the properties of the films. In this work, we present the results of a simplified experimental apparatus to follow by in situ optoelectrochemical measurements the potential versus time versus reflectance while the oxide films are growing by galvanostatic anodizing. The results are used to determine the refraction index and thickness of the films. The values are in agreement to theoretical and experimental results published elsewhere.
机译:众所周知,通过将样品放置在电化学中,可以在这些金属和合金的表面上阳性地生长铌和钽戊氧化铌和其混合氧化物,(Nb,Ta)_(2)O_(5)的薄膜,通过放置样品,可以在这些金属和合金的表面上生长在合适的阳极电压下含有在水溶液和两三个电极的细胞。这些薄膜表现出根据厚度变化颜色。已经使用了几种技术来表征薄膜的性质。在这项工作中,我们介绍了通过原位光电子化学测量来遵循简化实验装置的结果,而氧化膜通过Galvanostatic阳极氧化而生长的潜在对反射率。结果用于确定膜的折射率和厚度。这些价值观于其他地方发表的理论和实验结果。

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