首页> 外文会议>Meeting of the Electrochemical Society >Band Alignment at n-GaN/electrolyte Interface Explored by Photo-Induced Offset of Open-Circuit Potential for Efficient Water Splitting
【24h】

Band Alignment at n-GaN/electrolyte Interface Explored by Photo-Induced Offset of Open-Circuit Potential for Efficient Water Splitting

机译:通过光诱导的开路电位偏移探索的N-GAN /电解质接口处的带对准,用于高效的水分裂

获取原文

摘要

The band alignment at the interface between an electrolyte and n-GaN photoanode was investigated by observing open-circuit potential (OCP) of the GaN as a function of irradiated Xe-lamp intensity. The OCP drifted to negative values almost linearly with respect to the logarithm of light intensity, similarly to the behavior of open-circuit voltage in solar cells. For the smaller light intensity than 10~(-2) mW/cm~2, OCP value was less dependent on light intensity and it was sensitive to both the surface treatment of GaN and the surface damage which was introduced intentionally prior to the photoelectrochemical analysis by the irradiation of accelerated Ar atoms, high-energy electrons and γ-ray. The relationship between OCP and light intensity can be obtained without modifying the surface by photocurrent and it would be a good indicator how the surface treatment of a photoelectrode affects the photocatalytic activity.
机译:通过观察GaN的开路电位(作为照射的XE灯强度的函数,通过观察GaN的开路电位(OCP)来研究电解质和N-GaN光电码之间的带对准。类似于光强度的对数,OCP几乎线性地漂移到负值,类似于太阳能电池的开路电压的行为。对于较小的光强度超过10〜( - 2)Mw / cm〜2,OCP值较少依赖于光强度,并且对GaN的表面处理和表面损坏的表面损伤敏感,在光电化学分析之前有意地引入通过辐射加速的Ar原子,高能量电子和γ射线。可以获得OCP和光强度之间的关系,而不通过光电流改变表面,并且是一种良好的指标,光电极的表面处理如何影响光催化活性。

著录项

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号