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NCSL Interlaboratory Comparison of a One Ohm Resistance Standard, 1998 - 2000

机译:NCSL一个欧姆电阻标准的互通比较,1998 - 2000

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This paper reports the results of measurements performed on an artifact resistance standard of one ohm by 19 metrology laboratories throughout the United States. The goal of the Inter-laboratory Comparison (ILC) was to provide verification of each participating laboratory's measurement capability by obtaining a measurement that agrees with the Pivot Laboratory to within two parts per million. The ILC was organized using the guidelines provided by NCSL RP-15, Guide for Interlaboratory Comparisons. The costs associated with the Pivot Laboratory Measurements (NIST) were sponsored by the NCSL.
机译:本文报告了在整个美国的19个计量实验室的一个欧姆的伪影电阻标准进行了测量结果。实验室间比较(ILC)的目的是通过获得衡量标准的测量来提供每个参与的实验室的测量能力,以便在百万分之一的两部分内。使用NCSL RP-15提供的指导方针组织ILC,用于间接性比较指南。与枢轴实验室测量(NIST)相关的成本由NCSL赞助。

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