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Galvanostatic Pulse Plating of Cu-Al Alloy from the Lewis Acidic Aluminum Chloride-1-Ethyl- 3-methylimidazolium Chloride Melt

机译:来自路易斯酸性氯化铝-1-乙基-3-甲基咪唑氯化物的Cu-Al合金的电镀脉络

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The electrodeposition of certain transition metal-aluminum alloys, notably Ag-Al, Co-Al, Cu-Al, Fe-Al, and Ni-Al, from the Lewis acidic composition of chloroaluminate molten salts such as AlCl3-1-emyl-3-methylirnidazolium chloride (AlCl3-EtMeImCl) falls under Brenner's classification of induced co-deposition, i.e., aluminum is co-deposited with the transition metal at potentials more cathodic than the potential at which bulk aluminum is normally electrodeposited. Lewis acidic chloroaluminate molten salts constitute a reservoir of the reducible chloroaluminate ions; in the case of the AlCl3-EtMeImCl and related organic salt-based systems, the major reducible species is Al2Cl7.
机译:某些过渡金属 - 铝合金的电沉积,特别是Ag-Al,Co-Al,Cu-Al,Fe-Al和Ni-A1,来自氯铝酸盐的酸化组合物,如ALCL3-1-EMYL-3 - 甲基啶唑鎓氯化物(ALCL3-etmeimcl)在Brenner的诱导共沉积的分类下落下,即,铝在电位下与过渡金属相比,在电位上比通常电铝通常电铝的电位在潜在的电位下沉积。 Lewis酸性氯铝酸盐熔盐构成可再氯铝酸盐离子的储层;在ALCL3-ETMEIMCL和相关的基于有机盐的系统的情况下,主要的可还原物种是AL2CL7。

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