Synthesis and Corrosion Performance of Ultrathin Carbon Nitride Overcoats

摘要

Ultrathin films of carbon nitride were grown using do magnetron sputtering. A pulsed bias was applied to both the target and the substrate during deposition to help sustain a stable plasme and enhance ion bombardment of the growing film. These films exhibit excellent corrosion resisance at film thickness around 2 nm. Atomic force microscopy measurements reveal an atomically smooth surface. The role of pulsed bias and bombardment by ionized species in obtaining low defect-density coatings is discussed.