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Quaternary Ammonium Borohydride Adsorption in Mesoporous Silicate MCM-48

机译:季铵硼氢化物在中孔硅酸盐MCM-48中吸附

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Inorganic borohydrides have a high gravimetric hydrogen density but release H2 only under energetically unfavorable conditions. Surface chemistry may help in lowering thermodynamic barriers, but inclusion of inorganic borohydrides in porous silica materials has proved hitherto difficult or impossible. We show that borohydrides with a large organic cation are readily adsorbed inside mesoporous silicates, particularly after surface treatment. Thermal analysis reveals that the decomposition thermodynamics of tetraalkylammonium borohydrides are substantially affected by inclusion in MCM-48. Inelastic neutron scattering (INS) data show that the compounds adsorb on the silica surface. Evidence of pore loading is supplemented by DSC/TGA, XRD, FTIR, and BET isotherm measurements. Mass spectrometry shows significant hydrogen release at lower temperature from adsorbed borohydrides in comparison with the bulk borohydrides. INS data from partially decomposed samples indicates that the decomposition of the cation and anion is likely simultaneous. These data confirm the formation of Si-H bonds on the silica surface upon decomposition of adsorbed tetramethylammonium borohydride.
机译:无机硼氢化硼具有高重量氢密度,但仅在能量上不利的条件下释放H2。表面化学可能有助于降低热力学屏障,但在多孔二氧化硅材料中包含无机硼氢化硼在迄今为止难以或不可能。我们表明,具有大有机阳离子的硼氢化物易于吸附在中孔硅酸盐内,特别是在表面处理之后。热分析表明,四烷基铵硼氢化硼的分解热力学基本上通过包含在MCM-48中的影响。无弹性中子散射(INS)数据显示该化合物吸附在二氧化硅表面上。孔隙载荷的证据通过DSC / TGA,XRD,FTIR和BET等温线测量补充。质谱法显示出与散装硼氢化硼的吸附硼氢化物的较低温度的显着氢释放。来自部分分解样本的数据表明阳离子和阴离子的分解很可能是同时的。这些数据在分解吸附的四甲基硼氢化氢化物时,确认在二氧化硅表面上形成Si-H键。

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