Interface Conduction between Conductive ReO{sub}3 Thin Film and NdBa{sub}2Cu{sub}3O{sub}6 Thin Film

摘要

The Re oxide Films were deposited on quartz glasses by RF reactive sputtering from a Re metal target. The lowest resistivity was observed in the film in-situ annealed at 200°C in Ar atmosphere and showed the order of 10{sup}(-4) Ωcm of which the value was still about 10 times as large as that of a single crystal ReO{sub}3. The temperature dependence of the resistivity revealed a metallic behavior. A superconductivity did not take place in the bilayered film of ReO{sub}3 / NdBa{sub}2Cu{sub}3O{sub}6. In the interface region the resistivity minimum probably caused by the Kondo effect was observed in the neighborhood of 120K.