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Nano-structure control of cathode buffer-layers and luminescent properties of organic electroluminescent device

机译:阴极缓冲层的纳米结构控制和有机电致发光器件的发光性能

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Organic light emitting diodes (OLEDs) containing cathode buffer layers of nanometer thickness were fabricated and their electrical and emitting properties were investigated. The OLEDs have an indium tin oxide (ITO) anode/copper phthalocyanine (CuPc)/N, N'-dephenyl-N,N'-bis(3-methylphenyl)- 1,1 '-diphenyl-4,4'-diamine (TPD)/8-hydroxyquinoline aluminum (Alq3)/buffer layer/Al cathode structure with the buffer layers made from alternating thin films of Alq3 and Al with nanometer thickness. Improvement of driving voltage and the efficiency for the devices were observed by insertion of the buffer layer. It was estimated that some modulations of the Schottky barrier at the Alq3 and the Al cathode interface were induced due to the insertion of the buffer layer and it caused an enhancement of electron injection from the Al cathode. A model of the band structure at the buffer layer was proposed.
机译:制造含有纳米厚度的阴极缓冲层的有机发光二极管(OLED),并研究了它们的电气和发射性能。 OLED具有氧化铟锡(ITO)阳极/铜酞菁(CUPC)/ N,N'-脱苯基-N,N'-BIS(3-甲基苯基) - 1,1' - 二苯基-4,4'-二胺(TPD)/ 8-羟基喹啉铝(ALQ3)/缓冲层/ Al阴极结构,具有由Alq3和Al的交替薄膜制成的缓冲层,具有纳米厚度。通过插入缓冲层观察驱动电压的提高和器件的效率。据估计,由于缓冲层的插入,诱导了在Alq3和Al阴极界面处的肖特基屏障的一些调制,并且它引起了来自Al阴极的电子注入的增强。提出了缓冲层处的带结构的模型。

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