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Morphology,annealing,and melting of ferroelectric langmuir-blodgett films of vinylidene fluoride (70) trifluoroethylene (30) copolymer

机译:偏二氟乙烯(70%)三氟乙烯(30%)共聚物的铁电Langmuir-Blodgett薄膜的形态学,退火和熔化

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We report an investigation of the effects of film thickness,deposition pressure,and annealing conditions on morphology and crystal structure of films of vinylidene fluoride (70% mol) and trifluoroethylene (30% mol) copolymer made by Langmuir-Blodgett (LB) deposition on silicon.The films were characterized with X-ray diffraction,electron microscopy,electron diffraction,and atomic force microscopy.The films are highly planer,with the polymer chains parallel to the film plane.The optimum deposition pressure range is 3-10 mN/m.Annealing at 120-135 degC in the paraelectric phase improves film crystallinity in the ferroelectric beta phase,with (110) orientation.The film thickness has a small effect on film morphology,and very little effect on crystallinity.Melting the films at 150 degC results in destruction of the (110) crystallites and grwth of 6mumX0.3mum lamella-like structures with a different orientation.This results in polymer chain segments tilted out of the film plane,as confirmed by infrared ellipsometry.
机译:我们报告了通过Langmuir-Blodgett(LB)沉积的偏二氟乙烯(70%摩尔)和三氟乙烯(30%摩尔)共聚物的形态和晶体结构对膜厚度,沉积压力和退火条件的研究silicon.The薄膜进行了X射线衍射,电子显微术,电子衍射,和原子力microscopy.The膜是高度刨床,与聚合物链平行于膜plane.The最佳沉积的压力范围是3-10 MN /在顺电相在120-135摄氏度m.Annealing改善铁电β相膜的结晶度,具有(110)orientation.The膜的厚度,在150 crystallinity.Melting薄膜上薄膜形态的影响小,很少影响摄氏度导致在(110)微晶和6mumX0.3mum的grwth薄片状,在膜平面的倾斜出聚合物链段不同的orientation.This结果结构的破坏,如确认b y红外椭圆形测量。

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