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Mastering layer thickness distributions

机译:掌握层厚度分布

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A very practical and easy to use software package, called ELSY (Electrochemical Systems), will be presented. ELSY has been designed to find quick answers to problems related with layer thickness distributions. The software is applicable for a broad range of plating processes including co-deposition. The influence of the reactor geometry, screens, the shape of the workpieces to be plated, the applied voltage or current, the ohmic voltage drop in electrodes on the current density and consequently the layer thickness can easily be calculated. First the mathematical model is briefly explained. Then the following applications with industrial relevance are presented: Cu-plating on wafers and PCB's and electrode growth. Finally the potentialities of ELSY{sup}+, a software considering also influences of fluid flow and concentration gradients, will be demonstrated.
机译:将提出一个非常实用且易于使用的软件包,称为Elsy(电化学系统)。 ELSY旨在为与层厚度分布相关的问题进行快速答案。该软件适用于广泛的电镀过程,包括共沉积。电反应器几何形状,屏幕,待镀工件的形状,施加的电压或电流,电极上的欧姆电压降的影响,可以容易地计算电极上的欧姆电压下降,因此可以容易地计算层厚度。首先,简要解释数学模型。然后提出以下具有工业相关性的应用:晶片和PCB和电极生长的Cu电镀。最后,将证明考虑到流体流动和浓度梯度的软件的潜力{Sup} +的潜力。

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