By use of dc-magnetron sputtering, (111) textured Ag/Ni multilayered thin films were deposited with nominal bilayer repeat lengths ranging from 2 nm to 250 nm. Bulk and interface stresses were obtained from X-ray diffraction and measurements of substrate curvatures. Both in-plane and out-of-plane expansions were observed in the Ni layers, and a compressive interface stress of -2.24+-0.21 J/m~2 was found. This is in agreement with a previously published result of the interface stress in Ag/Ni thin films which had, as opposed to the present multilayers, a high level of total stress.
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