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Optimal design of stagnation-flow movpe reactors with axisymmetric multi-aperture inlets

机译:具有轴对称多孔入口的停滞流动MOVPE反应器的最佳设计

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An approach for optimal design of vertical stagnation flow Metalorganic Vapor Phase Epitaxy (MOVPE) reactors that minimizes parasitic pre-reactions between the film precursors is presented. The use of axisymmetric multi-aperture inlets (e.g. tube-in-tube or concentric-ring inlets) enables the separation of incompatible precursors, while preserving the axial symmetry of the reactor. A careful selection of the inlet velocity of each stream and the distance between the inlet and the susceptor (reactor height) can lead to complete mixing just above the substrate, while keeping the contact time between the precursors in the gas phase low enough to suppress pre-reactions. This idea has been used by our group for growing high quality ZnSe films on GaAs substrates from (CH_3)_2Zn:Z(C_2H_5)_3 and H_2Se diluted in H_2 in a stagnation flow MOVPE reactor with an axisymmetric split inlet. A transport model describing the MOVPE of ZnSe, for conditions at which the growth rate is limited by the precursors' arrival rate at the surface, has been developed. A parametric study was performed aiming at identifying operating conditions in industrial-scale reactors that maximize film thickness uniformity while minimizing precursor contact time. Operation at Gr/Re~2<100 eliminated flow recirculations in the region above the substrate. Such recirculations may lead to formation of particulates by trapping reactants. Optimal conditions correspond to equal velocities of the inlet streams, satisfying the above criterion, and to the minimum possible reactor height leading to uniform film thickness across the substrate.
机译:为垂直的停滞优化设计的方法流金属有机气相外延(MOVPE)反应器以最小化该膜前体之间的寄生预反应被呈现。使用轴对称多孔径入口(例如管中管或同心环入口)使不相容的前体的分离,同时保持反应器的轴对称。每个流和所述入口和所述基座(反应器高度)之间的距离的入口速度的仔细选择可以导致完全只是在基板上方混合,同时保持前体之间的接触时间在气相足够低以抑制预-reactions。这种想法已经使用由我们的组从在GaAs衬底上生长高品质的ZnSe膜(CH_3)_2Zn:Z(C_2H_5)_3和H_2Se稀释在H_2中的滞流流MOVPE反应器中的轴对称分裂入口。的运输模型描述的ZnSe的MOVPE,在其中生长速率是由在表面的前体到达速率的限制的条件下,已经研制成功。参数研究进行旨在识别工业规模的反应器中,最大限度地提高薄膜厚度的均匀性,同时最小化前体的接触时间操作条件。操作在基板上方的区域的Gr / RE〜2 <100消除流动再循环。这种再循环可以通过捕获反应物导致形成颗粒。最佳条件对应于所述入口流的相等的速度,满足上述标准,并且以最小的可能反应器高度导致整个衬底上均匀的膜厚。

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