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Analytical study of vertical Hall (VH)-devices using an adapted conform mapping technique.

机译:垂直大厅(VH) - 使用适应符合综合体映射技术的分析研究。

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We adapt the conform mapping technique to the analytical calculation of two dimensional vertical Hall (VH)-devi-ces with five electrical contacts. With our new method the finite size of the two output current electrodes is taken into account. The mapping technique has been extended to VH-devices embeded in a well or in a guard-ring. Different cases, all based on a typical VH-device, have been studied to illustrate the potentialities of the method. We calculate the geometry factor, the series resistance as well as the current unbalanc between both output current electrodes. Such accurate alculations are especially required in order to understand the efficient linearization schemes recently developed for such VH-devices.
机译:我们将符合绘图技术调整到具有五个电触点的二维垂直霍尔(VH)的分析计算 - DEVI-CES。通过我们的新方法,考虑了两个输出电流电极的有限尺寸。映射技术已经扩展到嵌入井或护栏中的VH器件。已经研究了基于典型的VH-Device的不同情况,以说明该方法的潜力。我们计算几何系数,串联电阻以及两个输出电流电极之间的电流Unbalanc。为了了解最近为这种VH设备开发的有效线性化方案,尤其需要这种准确的撒布。

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