Research on laser direct writing system and its lithography properties

摘要

Laser Direct Writing System(LDWS) is a key equipment for manufacturing the binary optical masks. A polar coordinate laser direct writing system was developed and the maximum mask size which can be made is 4 inches. One of its main properties.namely lithography; resolution. was analyzed based on the optical intensity distribution in the photoresist. Normally, 0.86μm linewidth on masks can be achieved. In some special case. a super resolution of 0.5μm linewidth can also be obtained. and itwill require a more rigorous exposure latitude. The exposure experiment results on LDWS showed good agreement with the theoretical calculations. The approach by using the optical intensity distribution in the photoresist to predict the relations betweenlinewidths and exposure latitude gives out a simple and clear image about the effects of photoresist on lithographic linewidths.