FPN (Fountain Pen Nanolithography) is researched to supplement institutes for regionalism of Dip-pen's process time [1][2]. However, FPN only has been using capillary force for flow in channel when tip contacted on surface. In existing research, FPN has an issue of fabrication and flow's analysis. In this paper, new design AFPN (Active Fountain Pen Nanolithography) uses open and close control. Reservoir upper tip is designed. We analyze load of flux and atmospheric pressure from opened part of reservoir. When tip is contacted on surface, flux is outpoured by tip's repulsive force. We present analysis that control flux according to force that gives pressure to tip.
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