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Composite films of copper/ boron nitride and nickel / boron nitride

机译:铜/氮化物和氮化镍/氮化物的复合薄膜

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The fromation and characterization of composite films of copper/boron nitride (Cu/BN) and nickel/boron nitride (Ni/BN) are described. Composite Cu/BN and Ni/Bn films were synthesized by a metla electrodeposition from suspensions of boron nitride particles on carbon steel substrates. The effects of concentration of boron nitride in the solution, temperature, potential and various additives on the morphology of compoosite films have been investigated. The morphology of these films was examined using Scanning Electron Microscopy. The elemental analysis for boron, nitrogen, copper and nickel was performed using Energy Dispersive X-ray Spectroscopy (EDS), and a Microprode X-ray Analyzer. The Vickers hardness of Cu/BN and Ni/BN films prepared under different conditions was also investigated. It has been found that the composite Cu/BN and Ni/BN films have an increased microhardness as compared to the respective pure metal films. The effects of deposition potential, temperature, concentration of Bn and presence of various additives on the microhardness of Cu/BN and Ni/BN films have been investigated.
机译:描述了铜/氮化物(Cu / Bn)和氮化镍/氮化镍(Ni / Bn)的复合薄膜的毛发和表征。通过在碳钢基材上的氮化硼颗粒的悬浮液中通过Metla电沉积合成复合Cu / Bn和Ni / Bn膜。研究了氮化硼浓度在溶液,温度,潜力和各种添加剂上进行了对康多薄膜形态的影响。使用扫描电子显微镜检查这些薄膜的形态。使用能量分散X射线光谱(EDS)和微助力X射线分析仪进行硼,氮,铜和镍的元素分析。还研究了在不同条件下制备的Cu / Bn和Ni / Bn膜的维氏硬度。已经发现,与相应的纯金属膜相比,复合Cu / Bn和Ni / Bn膜具有增加的微硬度。研究了沉积电位,温度,浓度Bn和各种添加剂对Cu / Bn和Ni / Bn膜的微硬度存在的影响。

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