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Themopower, electrical and hall conductivity of undoped and doped iron disilicide single crystals

机译:未掺杂和掺杂铁二硅化物单晶的题目,电气和霍尔电导率

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The electrical transport properties of beta -FeSi_2 single crystals have been investigated in dependence on the purity of the source material and on doping with 3d transition metals. The transport properties included are electrical conductivity, Hall conductivity and thermopower mainly in the temperature range from 4K to 300K. The single crystals have been prepared by chemical transport reaction in a closed system with iodine as transport agent. In undoped sinle crystals prepared with 5N Fe both electrical conductivity and thermopower depende on the composition within the homogeinity range of beta -FeSi_2 which is explained by different intrinsic defects at the Si-rich and Fe-rich phase boundaries. In both undoped and doped single crystals impurity band conduction is observed at low temperatures but above 100K extrinsic behaviour determined by shallow impurity states. The thermopower shows between 100K and 200K a significant phonon drag contribution which depends on intrinsic efects and additional doping. The hall resistivity is considered mainly with respect to an anomalous contribution found in n-type single crystals and tin films. In addition doped single crystals show at temperatures below about 130K an hysteresis of the Hall voltage. These results make former mobility data uncertain. Comparison will be made between the transport properties of single crystals and polycrstalline material.
机译:已经研究了β-Fesi_2单晶的电气传输性质,其依赖于源材料的纯度和3D过渡金属的掺杂。包括的运输性能包括导电性,霍尔电导率和热电机,主要在4k至300​​k的温度范围内。通过用碘作为运输剂的封闭系统中的化学传输反应制备单晶。在未掺杂的中晶体中,用5N Fe制备的β-Fesi_2的均质周期内的组合物,其在β-Fesi_2内的组合物中由不同的内在缺陷在富含Si的富含的相界面的不同内在缺陷中解释。在低温下观察到未掺杂和掺杂的单晶杂质带传导,但通过浅杂质状态测定的100K以上的外在行为。 Thermodower在100k和200k之间显示出显着的声子拖动贡献,这取决于内在的效果和额外的掺杂。霍尔电阻率主要是关于在n型单晶和锡膜中发现的异常贡献。此外,掺杂的单晶在低于约130k的温度下显示霍尔电压的滞后。这些结果使前所不能的数据不确定。将在单晶和多晶材料的运输性质之间进行比较。

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